Periodicities in the roughness and biofilm growth on glass substrate with etching time: Hydrofluoric acid etchant

Effect of hydrofluoric acid concentration and etching time on the surface roughness of CAD/CAM ceramics

Introduction: Dental ceramics are considered as materials that can restore the appearance of natural teeth. Etching the inner surface of a ceramic restoration with hydrofluoric acid (HF) followed by using a silane coupling agent is a well-known and recommended method to increase the bond strength. The aim of etching on ceramic structure is to enhance the surface roughness (Ra) and energy and to...

Etching with Hydrofluoric Acid

Photoresists, wafers, plating solutions, etchants and solvents ... Phone: +49 731 977343 0 www.microchemicals.eu [email protected] Etching of SiO2, Quartz, and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO2, quartz, or glasses at significant high etch rate. However, HF is not only a strong corrosive, but also highly toxic towards higher concentrations: ...

Etching with Hydrofluoric Acid

Photoresists, developers, remover, adhesion promoters, etchants, and solvents ... Phone: +49 731 36080-409 www.microchemicals.eu e-Mail: [email protected] Etching of SiO2, Quartz, and Glasses with HF Hydrofluoric acid is the only etchant which attacks amorphous SiO2, quartz, or glasses at significant high etch rate. However, HF is not only a strong corrosive, but also highly toxic towards...

Effect of hydrofluoric acid etching duration on the roughness and flexural strength of a lithium disilicate-based glass ceramic.

The aim of this study was to examine the effect of different acid etching times on the surface roughness and flexural strength of a lithium disilicate-based glass ceramic. Ceramic bar-shaped specimens (16 mm x 2 mm x 2 mm) were produced from ceramic blocks. All specimens were polished and sonically cleaned in distilled water. Specimens were randomly divided into 5 groups (n=15). Group A (contro...

Study of Selective Wet Etching of Titanium towards Copper in Hydrofluoric Free Etchant